- Title
- The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering
- Creator
- Field, M. R.; McCulloch, D. G.; Lim, S. N. H.; Anders, A.; Keast, V. J.; Burgess, R. W.
- Relation
- Journal of Physics: Condensed Matter Vol. 20, Issue 17
- Publisher Link
- http://dx.doi.org/10.1088/0953-8984/20/17/175216
- Publisher
- Institute of Physics (IOP) Publishing
- Resource Type
- journal article
- Date
- 2008
- Description
- Pulsed cathodic arc and pulsed magnetron sputtered WO₃ thin films were investigated using electron microscopy. It was found that the cathodic arc deposited material consisted of the α-WO₃ phase with a high degree of crystallinity. In contrast, the magnetron sputtered material was highly disordered making it difficult to determine its phase. Electron energy-loss spectroscopy was used to study the oxygen K edge of the films and it was found that the near-edge fine structures of films produced by the two deposition methods differed. The oxygen K-edge near-edge structures for various phases of WO₃ were calculated using two different self-consistent methods. Each phase was found to exhibit a unique oxygen K edge, which would allow different phases of WO₃ to be identified using x-ray absorption spectroscopy or electron energy-loss spectroscopy. Both calculation methods predicted an oxygen K edge for the. γ-WO₃ phase which compared well to previous x-ray absorption spectra. In addition, a close match was found between the oxygen K edges obtained experimentally from the cathodic arc deposited material and that calculated for the α-WO₃ phase.
- Subject
- charge state distributions; near edge structures; x-ray absorption; crystal structure; WO₃; phase; field
- Identifier
- uon:5408
- Identifier
- http://hdl.handle.net/1959.13/43287
- Identifier
- ISSN:0953-8984
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